Magma® Design Automation introduced significant enhancements to Knights CamelotTM, the industry-standard CAD navigation system, including an option making Camelot the first CAD navigation tool that enables failure analysis engineers to perform design rule checking (DRC) in the fab. Camelot's new options tighten the link between design and manufacturing, and drastically decrease time to high-volume yield and manufacturing costs of advanced ICs. The new On-Line Search Analyzer option speeds and simplifies the search function for failure analysis. One such application improves focused ion beam (FIB) modifications by automating the traditionally manual task of searching for "FIB-able" regions. In this case, the On-Line Search Analyzer performs a three-dimensional search of the layout file for areas where an FIB system can drive a beam through the circuitry to a point of interest that does not intersect or impact underlying geometric structures. This new option integrates Magma's DRC capabilities, making Camelot the first and only CAD navigation tool that enables failure analysis engineers to utilize DRC functions in the fab. With these new capabilities, users can now define applications for a variety of failure analysis and device debug techniques. This flexibility allows them to shorten cycle time for device debug and repair, and to reduce scrap.
The new Hot-Spot Analyzer option analyzes multiple regions in the layout and finds netlist segments that are close to or intersect with these regions. Typically, the regions define photon emissions (emission spots), and the nets in each hot-spot region and number of hot spots for each net are then displayed. This capability shortens the diagnostic process time with Emission Microscope (EMMI) tools. The new Live Image Overlay option dramatically improves the accuracy of fab tool stage mechanisms that align to layout. To address the potential stage inaccuracy of many high-magnification review, analysis, probe and scanning electron microscope (SEM) tools, the Live Image Overlay option captures an image of the device under inspection and overlays the image onto the design layout. Using advanced mapping technology, it then determines key common features to both the image and layout and then aligns those features. This alignment between the image and the layout compensates for any stage inaccuracies and enables a tool to accurately utilize the design layout to drive to exact coordinates.
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